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Patrick Naulleau

20 cilt bulundu.

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Extreme Ultraviolet (EUV) Lithography II

Bruno M. La Fontaine, Patrick Naulleau · SPIE-International Society for Optical Engineering

1040 sayfa · 2011

Extreme ultraviolet lithography

Extreme Ultraviolet (EUV) Lithography III.

Bilinmeyen yazar · Yayınevi bilinmiyor

Sayfa sayısı yok · 2012

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Coherence and Speckle Techniques for Imaging Through Highly Scattering Media and Optical Fibers

Patrick Pascal Naulleau · Yayınevi bilinmiyor

426 sayfa · 1997

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Les uns, les autres

Nathalie Azoulai, Patrick Besson, Arnaud Cathrine, Collectif, Jean-Michel Delacomptée, Emmanuelle Dugain-Delacomptée, Jean-Paul Enthoven, Yves Harte, Cécile Ladjali, · Robert Laffont

CiltModeling of EUV Photoresists with a Resist Point SpreadfunctionPatrick Naulleau, Jason P. Cain, Costas J. Spanos

Modeling of EUV Photoresists with a Resist Point Spreadfunction

Patrick Naulleau, Jason P. Cain, Costas J. Spanos · Yayınevi bilinmiyor

Sayfa sayısı yok · 2005

CiltExtreme Ultraviolet (EUV) Lithography IVBilinmeyen yazar

Extreme Ultraviolet (EUV) Lithography IV

Bilinmeyen yazar · Yayınevi bilinmiyor

Sayfa sayısı yok · 2013

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CiltResist-based Measurement of Contrast Transfer Function in a 0.3-NAmicrofield OpticPatrick Naulleau, Jason P. Cain, Costas J. Spanos

Resist-based Measurement of Contrast Transfer Function in a 0.3-NAmicrofield Optic

Patrick Naulleau, Jason P. Cain, Costas J. Spanos · Yayınevi bilinmiyor

Sayfa sayısı yok · 2005

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CiltLithographic Measurement of EUV Flare in the 0.3-NA Micro ExposureTool Optic at the Advanced Light SourcePatrick Naulleau, Jason P. Cain, Costas J. Spanos

Lithographic Measurement of EUV Flare in the 0.3-NA Micro ExposureTool Optic at the Advanced Light Source

Patrick Naulleau, Jason P. Cain, Costas J. Spanos · Yayınevi bilinmiyor

Sayfa sayısı yok · 2005

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CiltLithographic Characterization of Low-order Aberrations in a 0.3-NAEUV Microfield Exposure ToolKenneth A. Goldberg, Patrick Naulleau, Jason Cain, Kim Dean

Lithographic Characterization of Low-order Aberrations in a 0.3-NAEUV Microfield Exposure Tool

Kenneth A. Goldberg, Patrick Naulleau, Jason Cain, Kim Dean · Yayınevi bilinmiyor

Sayfa sayısı yok · 2006

Kategori yok

CiltCritical Dimension Sensitivity to Post-exposure Bake Temperaturevariation in EUV PhotoresistsPatrick Naulleau, Jason P. Cain, Costas J. Spanos

Critical Dimension Sensitivity to Post-exposure Bake Temperaturevariation in EUV Photoresists

Patrick Naulleau, Jason P. Cain, Costas J. Spanos · Yayınevi bilinmiyor

Sayfa sayısı yok · 2005

Kategori yok

CiltTwo-wave Pattern Shift Aberration Monitor for Centrally Obscuredoptical SystemsPatrick Naulleau, Jason P. Cain, Bruno La Fontaine, Adam Pawloski, Costas Spanos, Obert Reeves Wood, Gregory McIntyre, AndrewR. Neureuther

Two-wave Pattern Shift Aberration Monitor for Centrally Obscuredoptical Systems

Patrick Naulleau, Jason P. Cain, · Yayınevi bilinmiyor

CiltInvestigation of the Current Resolution Limits of Advanced EUVresistsKenneth A. Goldberg, Patrick Naulleau, Paul Denham, Clemens Rammeloo, Jason P. Cain, Kim Dean, Brian Hoef, Bruno La Fontaine, Adam Pawloski, Carl Larson, Greg Wallraff

Investigation of the Current Resolution Limits of Advanced EUVresists

Kenneth A. Goldberg, Patrick Naulleau, Paul Denham, Clemens Rammeloo, Jason P. Cain, Kim Dean, Brian Hoef, Bruno La Fontaine, Adam Pawloski, Carl Larson, Greg Wallraff · Yayınevi bilinmiyor

Sayfa sayısı yok · 2005

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CiltCharacterization of Advanced EUV Resists Using the Berkeley METtoolPatrick Naulleau

Characterization of Advanced EUV Resists Using the Berkeley METtool

Patrick Naulleau · Yayınevi bilinmiyor

Sayfa sayısı yok · 2006

Kategori yok

CiltDarwin Art Treasures ExhibitionBilinmeyen yazar

Darwin Art Treasures Exhibition

Bilinmeyen yazar · Yayınevi bilinmiyor

Sayfa sayısı yok · 1868

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CiltAdvanced 0.3-NA EUV Lithography Capabilities at the ALS.Kenneth A. Goldberg, Patrick Naulleau, Paul Denham, Erik Anderson, Keith Jackson, Kim Dean, Brian Hoef

Advanced 0.3-NA EUV Lithography Capabilities at the ALS.

Kenneth A. Goldberg, Patrick Naulleau, Paul Denham, Erik Anderson, Keith Jackson, Kim Dean, Brian Hoef · Yayınevi bilinmiyor

CiltDesign and Fabrication of Advanced EUV Diffractive ElementsPatrick P. Naulleau, Eric M. Gullikson, J. Alexander Liddle, Erik H. Anderson, Farhad Salmassi

Design and Fabrication of Advanced EUV Diffractive Elements

Patrick P. Naulleau, Eric M. Gullikson, J. Alexander Liddle, Erik H. Anderson, Farhad Salmassi · Yayınevi bilinmiyor

9 sayfa · 2003

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CiltHolographic Optical Elements for the Extreme-ultravioletregimePatrick P. Naulleau, Eric M. Gullikson, Erik H. Anderson, Farhad Salmassi

Holographic Optical Elements for the Extreme-ultravioletregime

Patrick P. Naulleau, Eric M. Gullikson, Erik H. Anderson, Farhad Salmassi · Yayınevi bilinmiyor

Sayfa sayısı yok · 2006

Kategori yok

Extreme ultraviolet lithographyExtreme Ultraviolet (EUV) Lithography IIIBilinmeyen yazar

Extreme Ultraviolet (EUV) Lithography III

Bilinmeyen yazar · Yayınevi bilinmiyor

Sayfa sayısı yok · 2012

Extreme ultraviolet lithography

Ciltחרוזים בני ביתBilinmeyen yazar

חרוזים בני בית

Bilinmeyen yazar · Yayınevi bilinmiyor

Sayfa sayısı yok · 1985

Kategori yok

CiltPreparations for EUV Interferometry of the 0.3 NA MET OpticKenneth A. Goldberg, Patrick P. Naulleau, Paul E. Denham, Eric Gullikson, J. Alexander Liddle, Erik H. Anderson, Bruce Harteneck, Keith H. Jackson, Senajith B. Rekawa

Preparations for EUV Interferometry of the 0.3 NA MET Optic

Kenneth A. Goldberg, Patrick P. Naulleau, Paul E. Denham, Eric Gullikson, J. Alexander Liddle, Erik H. Anderson, Bruce Harteneck, Keith H. Jackson, Senajith B. Rekawa · Yayınevi bilinmiyor

16 sayfa · 2003

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